DisChem's HSQ Negative EBL Resist provides superior resolution and etch resistance for nanoscale fabrication. Our negative tone resist ensures high contrast and minimal line edge roughness, making it ideal for advanced EBL applications where precision is paramount. This resist is designed to optimize pattern fidelity and reduce defects, ensuring reliable performance in complex nanofabrication processes.
Contact Us Phone Number : +1( 814 )-7726-603 Email ID : info@discheminc.com Address : 17295 Boot Jack Rd, Suite A PO Box 267 Ridgway, PA 15853 USA
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Ad Detail: HSQ Negative EBL Resist
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